IC-Custom offers two customization modes:
Position-aware
(precise placement in masked areas) and
Position-free
(subject-driven generation).
- Choose your customization mode
- Upload a reference image 📸
- Select input mask mode (precise mask or user-drawn mask)
- Upload target image and create mask (click for SAM or brush directly)
- Add text prompt (optional) - use VLM buttons for auto-generation
- Review and refine your mask using mask tools if needed
- Click Run ✨
- Write your text prompt (required) - describe the target scene
- Use VLM buttons for prompt auto-generation or polishing (if enabled)
- Click Run ✨
💡 Quick Tips:
Use Alt + "-" or ⌘ + "-" to zoom out for better operation •
Adjust settings in Advanced Options • Use mask operations (dilate/erode/bbox) for better results •
Try different seeds for varied outputs
🎉 Ready to start? Collapse this guide and begin customizing!
"""
citation = r"""
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